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X-ray Reflectivity Method

X-ray Reflectivity Method

XRR：X-ray Reflectivity

XRR measures the reflection intensity of X-rays incident on the sample surface at a very shallow angle. By comparing the reflection X-ray intensity profile obtained from this measurement with simulation results and optimizing the simulation parameters, this method determines the film thickness and density of the sample. - Evaluation of film thickness is possible (approximately 2 to 300 nm) - Evaluation of density is possible - Evaluation of surface roughness is possible (Rms ≤ 5 nm) - Non-destructive analysis is possible - Average information over a wide area of approximately 10×20 mm can be obtained

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  • Contract Analysis
  • Contract measurement
  • Contract Inspection

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[Analysis Case] Measurement of Film Density and Film Thickness of Organic EL Device Stacked Films

[Analysis Case] Measurement of Film Density and Film Thickness of Organic EL Device Stacked Films

X-ray reflectivity measurement (XRR) allows for non-destructive analysis of film thickness and density.

Organic EL displays are advancing in practical applications by leveraging advantages such as high brightness, high-resolution color, and thinness due to their self-emissive principle. Organic EL devices are manufactured by stacking organic films, but analyzing the organic films in their stacked state has been challenging. This time, by using the XRR method, it has become possible to measure the film thickness and density of the organic films while maintaining the stacked state. Analysis of the thickness and density of stacked films is possible regardless of whether they are crystalline or amorphous.

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